High-Purity Graphite Processing/Modification

High-purity graphite modification is an advanced surface treatment technology. It enhances the overall performance of the material in high-temperature, corrosive, and semiconductor environments by depositing functional coatings on the surface of high-purity graphite substrates.

Characteristic

High Purity and Low Contamination: Uses high-purity graphite substrates with low impurity content, suitable for ultra-clean process environments.

Excellent High-Temperature Resistance: Maintains stable structure and performance at elevated temperatures without deformation or failure.

Enhanced Oxidation Resistance: Surface functional coatings effectively reduce high-temperature oxidation rates and extend service life.

Good Corrosion Resistance: Provides stable resistance to acids, alkalis, and process gases, suitable for complex operating conditions.

Stable Thermal Conductivity: Retains excellent thermal conductivity of graphite, enabling efficient heat transfer and temperature control.

Improved Surface Stability: Dense and uniform coating structure reduces particle shedding and surface contamination risk.

Parameter

Application field solutions

Semiconductor Process Equipment: Used for graphite-based structural parts and high-temperature functional components in CVD, PVD, and etching equipment.

Wafer Epitaxy and Deposition Systems: Applied in MOCVD, epitaxial growth, and wafer deposition processes as carrier and heating components.

High-Temperature Vacuum Furnace Systems: Used in vacuum sintering furnaces, high-temperature heat treatment furnaces, and protective structural components.

Photovoltaic and Electronic Material Equipment: Suitable for high-temperature graphite components in the production of monocrystalline silicon, polycrystalline silicon, and electronic materials.

High-Temperature Protection and Thermal Conductive Structures: Used in industrial systems requiring heat resistance, stable thermal conductivity, and oxidation protection.