AlN – Aluminum Nitride

Aluminum nitride (AlN) is widely used in components requiring efficient heat dissipation and in semiconductor manufacturing equipment due to its excellent thermal conductivity, electrical insulation properties, and a coefficient of thermal expansion close to that of silicon.

Characteristic

  • High Purity, High Temperature Resistance, and High Mechanical Strength
  • High Thermal Conductivity and Low Thermal Expansion Coefficient
  • High Electrical Insulation with Low Dielectric Constant
  • Excellent Resistance to Corrosion by Molten Metals

Parameter

Property Unit Value
Density g/cm³ 3.3
Mohs Hardness 7–8
Flexural Strength MPa 300–400
Melting Point °C >2200 (decomposes in N₂)
Maximum Service Temperature °C ~1350 (in air)
Thermal Conductivity (20°C) W/(m·K) 140–180
Thermal Expansion Coefficient K⁻¹ 4.5×10⁻⁶ – 5.0×10⁻⁶
Volume Resistivity (20°C) Ω·cm >10¹⁶
Dielectric Strength kV/mm 15–20
Dielectric Constant (1 MHz) 8.5–9.0

Application field solutions

High-Temperature Crucibles: Used for high-temperature melting and sintering processes. They provide excellent resistance to heat and corrosion, preventing material contamination.

IC Packaging Substrates / Heat Sinks: Used for chip packaging heat dissipation and circuit routing. They reduce junction temperature and improve device stability and reliability.

Semiconductor Equipment Components: Used as structural and insulating support parts in high-temperature and vacuum equipment, offering high-temperature resistance and contamination prevention.

High-Power LED Substrates: Used for LED thermal management and electrical insulation. They provide efficient heat dissipation, reduce light decay, and extend device lifespan.

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