Silicon Epitaxial Substrates: Provide a low-defect, high-thermal-conductivity support platform, ensuring uniform epitaxial layer growth and effective heat dissipation.

Single-Crystal Silicon Manufacturing Equipment Components: Used as crucible liners, flow-guiding, and thermal insulation structures. They are resistant to high temperatures and corrosion, preventing contamination of molten silicon.

MOCVD Substrates: Used as base substrates for GaN epitaxial growth, directly influencing the quality and performance of the epitaxial layer.

Heater Components: Used in high-temperature heating systems to provide a uniform and stable heat source.

Heat Sink Components: Used for rapid heat conduction and dissipation to maintain stable equipment temperature.

Anti-Oxidation Components: Used for protection in high-temperature oxidative environments, reducing oxidation-related material degradation.