High Purity: 99.999%, with a dense coating surface and excellent high-temperature resistance.
Resistance to Acid and Alkali Corrosion: Resistant to hydrogen (H₂), ammonia (NH₃), silane (SiH₄), and silicon (Si), providing reliable protection in harsh chemical environments.
Resistance to Plasma Etching: Resistant to reactive species such as chlorine and bromine, dopants such as boron, phosphorus, and arsenic, as well as corrosive cleaning agents.
Excellent Thermal Shock Resistance and Strong Coating Adhesion.
| Property | Unit | Value |
|---|---|---|
| Density | g/cm³ | 14.3 |
| Melting Point | °C | 3880 |
| Lattice Constant | Å | 4.454 |
| Hardness (HK) | HK | 2000 |
| Thermal Conductivity (25°C) | W/(m·K) | 22–25 |
| Thermal Conductivity (100°C) | W/(m·K) | 15–18 |
| Thermal Expansion Coefficient | K⁻¹ | 6.29 × 10⁻⁶ |
| Young’s Modulus | GPa | 291 |
| Electrical Resistivity | Ω·cm | 1 × 10⁻⁵ |
