High Purity: Dense, pore-free surface with no impurity release at high temperatures.
High-Temperature Resistance: Strength increases with temperature, reaching a maximum at around 2750°C, and sublimates at approximately 3600°C.
Excellent Thermal Shock Resistance: Low elastic modulus, high thermal conductivity, and a low coefficient of thermal expansion.
Excellent Chemical Stability: Resistant to corrosion from acids, alkalis, salts, and organic reagents.
| Property | Unit | Value |
|---|---|---|
| Purity | — | 99.999% |
| Flexural Strength | N/mm² | 127 |
| Thermal Conductivity (200°C) | W/(m·K) | 376 (a); 2.0 (c) |
| Thermal Expansion Coefficient (50–800°C) | K⁻¹ | 1.26 × 10⁻⁶ (a) |
| Electrical Resistivity | Ω·cm | 2 × 10⁻⁴ |
| Maximum Service Temperature | °C | 3600 |
Semiconductor Wafer Carrier Coating: Applied as a dense protective layer on wafer carriers to prevent direct contact between the carrier and wafers, reducing scratches, metal ion contamination, and particle generation.
Coating for Critical Semiconductor Equipment Components: Used as surface coatings for CVD reactor liners, ion implantation chamber parts, and high-temperature annealing furnace components.
Filter Coating Deposition Applications: Used in vacuum evaporation coating systems, it exhibits excellent stability under high-temperature and high-vacuum conditions without releasing impurities or causing outgassing, thereby ensuring high film purity and consistent coating quality.
Atomic Absorption Spectroscopy Equipment: Applied as a coating for graphite tubes in atomic absorption spectrometers. Compared with standard graphite tubes, it provides superior resistance to oxidation and chemical corrosion.
