PG Process Tube: A tubular functional component made from a high-purity graphite or ceramic substrate, with a dense pyrolytic graphite (PG) coating formed via chemical vapor deposition (CVD). It features excellent thermal conductivity uniformity, high-temperature resistance, and low chemical reactivity. It also provides low gas permeability and a smooth surface, effectively reducing material adhesion and contamination. With high structural strength, it is suitable for demanding vacuum or inert-atmosphere conditions and can operate reliably in continuous high-temperature processes over long periods.
Annealing Process:
Used for high-temperature heat treatment of wafers to relieve internal stress, improve crystal structure, and enhance both electrical and mechanical properties.
Semiconductor Manufacturing:
Serves as a carrier tube in reaction systems, providing uniform heat transfer to maintain consistent wafer temperature. Its low contamination characteristics help ensure precise semiconductor doping processes.
Material Synthesis:
Used in carbon material carbonization and ceramic sintering processes, providing a stable high-temperature environment. Its low gas permeability helps prevent atmospheric interference during processing.
Crystal Growth Support:
Functions as a protective transfer tube for raw materials, offering excellent high-temperature resistance and a smooth surface to minimize impurity adhesion during crystal growth.
Research & Laboratory Applications:
Used as a reaction vessel and sample protection tube in scientific research. Suitable for extreme temperature and atmospheric conditions, ensuring accurate and reliable experimental results.
