High Purity and Density: Purity up to 99.999%, with a dense, pore-free surface structure, excellent gas tightness, and low helium permeability.
High-Temperature and Thermal Properties: Capable of withstanding temperatures up to 2200°C, with strength increasing as temperature rises. It also exhibits excellent thermal shock resistance and anisotropic thermal conductivity.
Chemical Inertness: Resistant to corrosion from acids, alkalis, salts, and organic reagents. It is non-wetting and non-reactive with most molten metals and semiconductor materials.
| Property | Unit | Value |
|---|---|---|
| Density | g/cm³ | 1.95–2.20 |
| Tensile Strength | N/mm² | 102 |
| Flexural Strength | N/mm² | 243 |
| Compressive Strength | N/mm² | 244 |
| Thermal Conductivity (200°C) | W/(m·K) | 60 (a) / 2.60 (c) |
| Thermal Expansion Coefficient (200°C) | K⁻¹ | 2.0 × 10⁻⁶ (a) |
| Dielectric Constant (Room Temperature) | — | 5.81 |
| Electrical Resistivity | Ω·cm | 2.4 × 10¹⁵ |
Semiconductor Single Crystal Growth: Used in VGF (Vertical Gradient Freeze) and LEC (Liquid Encapsulated Czochralski) processes for growing III-V compound semiconductor single crystals such as GaAs (gallium arsenide) and InP (indium phosphide). The high purity and excellent high-temperature deformation resistance of PBN crucibles ensure low defect density and high crystal purity.
Molecular Beam Epitaxy (MBE): Serves as MBE crucibles for evaporating materials such as aluminum (Al) and gallium (Ga) to produce advanced epitaxial structures including superlattices and quantum wells. Its high purity and non-wetting properties ensure precise stoichiometry and high-quality thin films.
OLED Evaporation and Microelectronics: Used as evaporation source units in OLED deposition systems. It offers excellent high-temperature resistance and extremely low outgassing, enabling uniform evaporation, extended equipment lifetime, and improved display performance.
High-Temperature Metal Processing and Metallurgy: Applied in molten metal transfer and specialty metallurgical processes. Its thermal shock resistance and chemical inertness make it suitable for handling reactive metals and alloys.