Heating Plate

Aluminum Nitride (AlN) ceramic heater is a device used for heating semiconductor materials. It features excellent thermal conductivity and high-temperature resistance, enabling stable operation at elevated temperatures. Playing an important role in semiconductor manufacturing processes, Aluminum Nitride (AlN) ceramic heater can be applied in crystal growth, annealing, baking and other procedures.

Characteristic

High thermal conductivity, good temperature uniformity, good durability in plasma environment, and a coefficient of thermal expansion close to that of silicon

Parameter

Performance	Unit	Numerical value
Thermal conductivity	W/m·K	170-230
Maximum operating temperature	℃	1600
Temperature uniformity	℃	±1
Coefficient of thermal expansion	×10⁻⁶/℃	4.0-4.7

Application field solutions

It is applied to CVD equipment, PECVD equipment, ALD equipment, photolithography equipment and ion implanters

Product Display

暂无产品