Integrates heating and adsorption functions in one unit
Purity up to 5N (99.999%), with low impurity outgassing
High operating temperature, up to 800°C or higher
Capable of withstanding higher voltage
| Performance | Unit | Pyrolytic Boron Nitride (PBN) | Alumina (Al₂O₃) | Aluminum Nitride (AlN) |
| Density | g/cm³ | 2.1 | 3.8 | 3.2 |
| Purity | % | 99.999 | 99.8 | 98 |
| Flexural Strength | MPa | 244 | 350 | 400 |
| Thermal Conductivity | W/(m·K) | 82 (a-axis); 2.4 (c-axis) | 20 | 170 |
| Coefficient of Thermal Expansion | ×10⁻⁶ K⁻¹ | 2.4 (a-axis); 27 (c-axis) | 6.9 | 4.6 |
| Volume Resistivity | Ω·cm | 3.6×10¹⁶ | 1×10¹⁴ | 1.5×10¹³ |
| Dielectric Breakdown Strength | kV/mm | 200 | 25 | 20 |
In processes such as etching, thin film deposition, and ion implantation, the CVD electrostatic chuck—integrating heating and adsorption functions—can accurately meet the dual core requirements of “stable fixation + precise temperature control” in high-end manufacturing.
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