Excellent Stability： High-quality materials and precision control circuits are adopted to maintain stable evaporation rate and temperature during long-term operation, minimizing process fluctuations.
Superior Uniformity： The point source design enables precise control of evaporation angle and distribution, achieving high uniformity of thin film thickness, which is suitable for high-demand coating applications.
High Material Utilization Rate： The evaporator optimizes the material heating area to reduce waste, with a material utilization rate usually reaching over 80%, lowering production costs.
Strong Compatibility： Supports the evaporation of various materials, including metals, alloys, and compounds, to meet different process requirements.
| Performance | Unit | Value |
| Evaporation Rate | Å/s | 0.1–10 (adjustable) |
| Power Range | W | 100–5000 |
| Temperature Control Precision | °C | ±1 |
| Material Compatibility | / | Al, Ag, Mg, Yb, Cu, In, Ga, etc. |
| Vacuum Requirement | mbar | Base pressure ≤ 1×10⁻⁶ |
| Service Life | / | >1000 hours (depending on materials and usage) |
Widely used in OLED evaporation, CIGS thin-film evaporation, perovskite evaporation, and thin-film deposition experiments in scientific research. Its high-precision characteristics make it particularly suitable for applications requiring nanometer-scale control.
No. 88, Nanhuan East Road, Yucheng City, Shandong Province
